Call Detail
Art of the Word

Entry Deadline: 10/31/23
Application Closed

Entry Fee (Entry Fee): $30.00
Media Fee(Additional Entry): $15.00
Sasse Museum of Art Membership: $15.00
Work Sample Requirements
Images | Minimum:Min. 1, Maximum:Max. 10
Total Samples | Minimum:Min. 1, Maximum:Max. 10
Call Type: Exhibitions
Eligibility: International
State: California

 Art of the Word 

A Juried, Visual Art, Online Exhibit.


The Art of the Word is a virtual showcase of visual narratives, leading its audience on a curated artistic journey. Every page of the catalog unveils the remarkable creation of a different artist, interweaving images to form a harmonious experience. This online exhibition is a discerning selection of artworks incorporating words or characters, creating a unique fusion of art and language. The catalog will be published on November 15, 2023, on the museum's catalog tab allowing visitors to explore and appreciate the artistry that transcends traditional boundaries between visual art and the written word.

Last year’s juried exhibit catalog, SeeMe, can be viewed at:

Artists and photographers worldwide are invited to participate in our exhibition. We welcome all types of visual art. We will select 100 artists for the catalog, and three artists will be featured in a four-page spread to showcase three of their best images and an artist profile.

The Jury:    

                        Fatemeh Burnes is an artist, educator, curator, and activist based in Los Angeles. She obtained formal and informal artistic training, received a BFA and MFA, and did additional graduate studies in art history and exhibition design. Since 1992, she has exhibited her own work nationally and internationally, curated over 100 exhibitions, and authored numerous publications. 
Fatemeh’s painting and photography focus on nature and human nature by looking at modern events and tragedies, both ecological and social, and how those events manifest in contemporary life. Some of her most
current work highlights environmental and identity issues, specifically in the context of her experiences as an
immigrant and as a woman.

                        Maurice Quillinan, an acclaimed Irish artist, offers a distinctive perspective on modern Irish art through his paintings and prints. With global exhibitions representing Ireland, his pieces reside in public and private collections in 34 countries. Educated at LSAD, RCA, Ecole Nationale Superieur des Beaux-Arts, and UL, his work revolves around the variability of memory, showcased in semi-abstract narratives across diverse media. Quillinan's artistic expression extends to curating, with nearly 300 curated shows, projects, and events, including his solo exhibitions.  

                        Niamh Cunningham, a Beijing-based visual artist, explores ecological insights and collective transformation themes through her artwork. Using mixed media, photography, and paints, she introduces innovative techniques like the "Sucrose Series." Her Portraits delve into perception's nuances. She collaborated with the Institute of Process Engineering (IPE) on "Microbe Art." Light, transparency, and nature characterize her creations, such as "The Memory Palace of Tree Stories" and "Tree Planter."

Application Requirements

Entry Fees:      First Submission: $30

                        Additional Entries: $15

                        Sasse Museum of Art Members: $ 50% discount (Enter Code: M2023 at check out)

                        Sasse Museum of Art Membership: $15 

Submission Details: 

                        File Format: JPEG

                        Minimum size: 2700 pixels (9 inches) on the long dimension

                        Resolution: 300 pixels per inch (ppi)

                        Image Quality: 10 or above

                        Label Each File: last name_first name-title

                        Maximum Number of Submissions:  10

Eligibility Criteria

Student, amateur and professional artists and photographers worldwide are invited to participate. No artist's teams will be allowed to submit. All work must be original. No copies or work done from commercially prepared kits or molds will be accepted.